cluster ion

基本解释

Changes in surface roughness after gas cluster ion bombardments have been measured by an atomic force microscope.
用原子力显微镜测量了气体离化团束照射后表面粗糙度的变化。
The higher sputtering yield would result from multiple collision, lateral sputtering and high density energy deposition of gas cluster ion beam.
气体离化团束的高溅射产额可能是由于多体碰撞、侧向溅射及高能量密度的照射引起的。
The unique smoothing and cleaning effects of gas cluster ion beam wou1d result from multiple collision, lateral sputtering and high density energy deposition.
气体离化团束优良的平坦化和清洁化效果可能与照射中多体碰撞、侧向溅射及高能量密度的沉积相关。