glow discharge process

基本解释

The principle, discharge mode and alloying process of double glow discharge plasma surface alloying process were introduced particularly.
详细介绍了双层辉光离子渗金属技术的基本原理、放电模式及渗金属过程。
There are three important parameters in the DC glow discharge process, the discharge current, discharge voltage and argon pressure in discharge source.
直流辉光放电过程中需要控制的三个重要工作参数为放电电流、放电电压和放电室内氩气气压。
The relation between characteristics of hot cathode glow discharge and diamond film deposition techniques in hot cathode glow discharge plasma chemical vapor deposition process was discussed.
研究了在热阴极辉光放电等离子体化学气相沉积金刚石膜过程中，热阴极辉光放电特性与金刚石膜沉积工艺的关系。